Photomask and next-generation lithography mask technology IX

23-25 April, 2002, Yokohama, Japan

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Last edited by ImportBot
August 1, 2020 | History

Photomask and next-generation lithography mask technology IX

23-25 April, 2002, Yokohama, Japan

  • 0 Ratings
  • 0 Want to read
  • 0 Currently reading
  • 0 Have read

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Publish Date
Publisher
SPIE
Language
English
Pages
918

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Previews available in: English

Book Details


Edition Notes

Includes bibliographical references and author index.
Some earlier proceedings have title: Photomask and X-ray mask technology.

Published in
Bellingham, Wash
Series
SPIE proceedings series ;, v. 4754, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 4754.
Genre
Congresses.
Other Titles
Photomask and X-ray mask technology

Classifications

Dewey Decimal Class
621.3815/31
Library of Congress
TK7878 .P565 2002,

The Physical Object

Pagination
xxx, 918 p. :
Number of pages
918

ID Numbers

Open Library
OL3320498M
Internet Archive
photomasknextgen4754phot
ISBN 10
0819445177
LCCN
2004272510
OCLC/WorldCat
50613555
Goodreads
3598747

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History

Download catalog record: RDF / JSON
August 1, 2020 Edited by ImportBot import existing book
December 5, 2010 Edited by Open Library Bot Added subjects from MARC records.
April 28, 2010 Edited by Open Library Bot Linked existing covers to the work.
December 10, 2009 Created by WorkBot add works page