Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V

11-12 March 1986, Santa Clara, California

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Last edited by ImportBot
July 31, 2023 | History

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V

11-12 March 1986, Santa Clara, California

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Publish Date
Language
English
Pages
272

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Previews available in: English

Edition Availability
Cover of: Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V: 11-12 March 1986, Santa Clara, California
1986, SPIE--the International Society for Optical Engineering
in English

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Book Details


Edition Notes

Includes bibliographies and index.

Published in
Bellingham, Wash., USA
Series
Proceedings of SPIE--the International Society for Optical Engineering ;, v. 632
Other Titles
Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V.

Classifications

Dewey Decimal Class
621.3815/2
Library of Congress
TK7874 .E484 1986

The Physical Object

Pagination
vi, 272 p. :
Number of pages
272

ID Numbers

Open Library
OL2743457M
Internet Archive
electronbeamxray0632unse
ISBN 10
089252667X
LCCN
86061034
OCLC/WorldCat
13981354
Goodreads
3710399

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History

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July 31, 2023 Edited by ImportBot import existing book
December 11, 2022 Edited by MARC Bot import existing book
November 4, 2020 Edited by MARC Bot import existing book
April 3, 2019 Edited by MARC Bot import existing book
April 1, 2008 Created by an anonymous user Imported from Scriblio MARC record