Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V

11-12 March 1986, Santa Clara, California

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Last edited by MARC Bot
December 11, 2022 | History

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V

11-12 March 1986, Santa Clara, California

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Publish Date
Language
English
Pages
272

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Previews available in: English

Edition Availability
Cover of: Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V
Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V: 11-12 March 1986, Santa Clara, California
1986, SPIE--the International Society for Optical Engineering
in English

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Book Details


Edition Notes

Includes bibliographies and index.

Published in
Bellingham, Wash., USA
Series
Proceedings of SPIE--the International Society for Optical Engineering ;, v. 632
Other Titles
Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V.

Classifications

Dewey Decimal Class
621.3815/2
Library of Congress
TK7874 .E484 1986

The Physical Object

Pagination
vi, 272 p. :
Number of pages
272

ID Numbers

Open Library
OL2743457M
Internet Archive
electronbeamxray0632unse
ISBN 10
089252667X
LCCN
86061034
OCLC/WorldCat
13981354
Goodreads
3710399

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December 11, 2022 Edited by MARC Bot import existing book
April 3, 2019 Created by MARC Bot import existing book